MBRAUN
thin film deposition systemsare engineered for use in
university research, as well as in
large-scale industrial applications. We
offer both standard and custom thin film
deposition systems.
Building
multi-layer thin film layers requires
pure atmospheric conditions (<1 ppm of
Oxygen and moisture), and that fine
particles are removed quickly, reliably
and continuously.
MBRAUN OLED/PLED
thin film evaporator gloveboxes have
been designed for the deposition of
multilayer thin films; without
disturbing intermediate layers caused by physi, or chemi-sorption.
MBRAUN
thin film deposition systems and
components are highly reliable
systems that routinely achieve
coating uniformities of <5% in
semiconductor device fabrication
applications. Product configurations
range from stand-alone bell jars to
automatic loading systems in
gloveboxes for the coating of wafers
(and other applications) ranging in
size from 2" to 300mm. For more
information please check out
www.thermaldeposition.com
Integrated
Thin Film
Deposition (TFD)
Evaporator
Systems
The MB-EVAP
S/A vacuum
deposition
system is a
high
quality,
stand alone,
research &
development
tool
designed for
all of your
thin film
requirements.
The M.E.S.A.
system comes
standard as
a 2 to 4
resistive
source
system with
the
capability
to deposit
in sequence
or
simultaneously
and can also
be
configured
to include
RF or DC
sputter
sources as
well as
e-beam
sources. Our
design
incorporates
many of the
high quality
components
used by
similar
suppliers
while still
allowing
MBRAUN to offer our
systems at a
cost
competitive
price.
MBRAUN can
configure
the M.E.S.A.
system to
meet your
exact
requirements
in addition
to offering
a system
designed for
easy
integration
to an
MBRAUN inert
atmosphere
glovebox
system.
Please
contact
MBRAUN for more
information
on this
product.
